A temperature-stabilized LiF line filter for the argon 106.7 nm resonance line

H. Knop, M. Uhrig, M. Berkemeier, K. Becker, G. F. Hanne

Research output: Contribution to journalArticle

Abstract

We present a temperature-stabilized LiF filter of 1 mm thickness which was used to isolate the Ar resonance line at 106.7 nm from adjacent Ar and Ar+ emissions in the vacuum ultraviolet in electron-impact-induced photoemission experiments. Details of the construction of the filter and of its performance characteristics as a function of temperature are discussed.

Original languageEnglish (US)
Pages (from-to)1275-1278
Number of pages4
JournalMeasurement Science and Technology
Volume8
Issue number11
DOIs
StatePublished - Nov 1997

ASJC Scopus subject areas

  • Instrumentation
  • Engineering (miscellaneous)
  • Applied Mathematics

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