A temperature-stabilized LiF line filter for the argon 106.7 nm resonance line

H. Knop; M. Uhrig; M. Berkemeier; K. Becker; G. F. Hanne

doi:10.1088/0957-0233/8/11/011

A temperature-stabilized LiF line filter for the argon 106.7 nm resonance line

H. Knop, M. Uhrig, M. Berkemeier, K. Becker, G. F. Hanne

Research output: Contribution to journal › Article › peer-review

Abstract

We present a temperature-stabilized LiF filter of 1 mm thickness which was used to isolate the Ar resonance line at 106.7 nm from adjacent Ar and Ar⁺ emissions in the vacuum ultraviolet in electron-impact-induced photoemission experiments. Details of the construction of the filter and of its performance characteristics as a function of temperature are discussed.

Original language	English (US)
Pages (from-to)	1275-1278
Number of pages	4
Journal	Measurement Science and Technology
Volume	8
Issue number	11
DOIs	https://doi.org/10.1088/0957-0233/8/11/011
State	Published - Nov 1997

ASJC Scopus subject areas

Instrumentation
Engineering (miscellaneous)
Applied Mathematics

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10.1088/0957-0233/8/11/011

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title = "A temperature-stabilized LiF line filter for the argon 106.7 nm resonance line",

abstract = "We present a temperature-stabilized LiF filter of 1 mm thickness which was used to isolate the Ar resonance line at 106.7 nm from adjacent Ar and Ar+ emissions in the vacuum ultraviolet in electron-impact-induced photoemission experiments. Details of the construction of the filter and of its performance characteristics as a function of temperature are discussed.",

author = "H. Knop and M. Uhrig and M. Berkemeier and K. Becker and Hanne, {G. F.}",

year = "1997",

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AU - Knop, H.

AU - Uhrig, M.

AU - Berkemeier, M.

AU - Becker, K.

AU - Hanne, G. F.

PY - 1997/11

Y1 - 1997/11

N2 - We present a temperature-stabilized LiF filter of 1 mm thickness which was used to isolate the Ar resonance line at 106.7 nm from adjacent Ar and Ar+ emissions in the vacuum ultraviolet in electron-impact-induced photoemission experiments. Details of the construction of the filter and of its performance characteristics as a function of temperature are discussed.

AB - We present a temperature-stabilized LiF filter of 1 mm thickness which was used to isolate the Ar resonance line at 106.7 nm from adjacent Ar and Ar+ emissions in the vacuum ultraviolet in electron-impact-induced photoemission experiments. Details of the construction of the filter and of its performance characteristics as a function of temperature are discussed.

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JO - Measurement Science and Technology

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A temperature-stabilized LiF line filter for the argon 106.7 nm resonance line

Abstract

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