The formation of Si(1S) ground-state atoms from the neutral molecular dissociation of SiH4 by electron impact was studied. The formation absolute cross section was determined by electron scattering, coupled with laser-induced fluorescence measurements. A peak cross section of 4.5×10-17 cm2 was found at an impact energy of 60 eV, which when compared to a SiH4 neutral dissociation cross-section measured in a constant-flow plasma reactor, yields a branching ratio of about 0.037 for the formation process being studied. Absolute calibration is made relative to the cross-section of N2+(X) ground-state ions formation by electron impact on N2.
ASJC Scopus subject areas
- General Physics and Astronomy
- Physical and Theoretical Chemistry