Acid-base interaction in the adhesion between two solid surfaces

Gun Young Choi, Jung F. Kang, Abraham Ulman, Walter Zurawsky, Cathy Fleischer

Research output: Contribution to journalArticle

Abstract

A study of acid-base interactions in the adhesion between solid surfaces is presented. Adhesion was studied between various OH-functionalized self-assembled monolayer (SAM) surfaces and poly(dimethylsiloxane) (PDMS) cross-linked networks using the contact deformation mechanics method. An increase in adhesion strength was observed in the order of increasing acidity of surface OH protons [Au/S(CH2)11OH<Au/S(C6H4)2OH<Au/S (CH2)15COOH<Au/S(CH2)11PO(OH)2]. Systematic control of surface OH concentration revealed that the strength of adhesion is proportional to the number of surface OH groups but that the relationship is highly nonlinear, probably due to the collective nature of H-bonding between the PDMS chain and surface OH groups. Intermolecular H-bonding at the surface of phosphonic acid (11-mercaptoundecyl phosphonic acid SAMs) results in decreased adhesion.

Original languageEnglish (US)
Pages (from-to)8783-8786
Number of pages4
JournalLangmuir
Volume15
Issue number26
DOIs
StatePublished - Dec 21 1999

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Spectroscopy
  • Electrochemistry

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    Choi, G. Y., Kang, J. F., Ulman, A., Zurawsky, W., & Fleischer, C. (1999). Acid-base interaction in the adhesion between two solid surfaces. Langmuir, 15(26), 8783-8786. https://doi.org/10.1021/la991222h