Atomic-scale analysis of radical precursor and hydrogen surface diffusion on plasma-deposited amorphous silicon thin films

Mayur S. Valipa, Tamas Bakos, Eray S. Aydil, Dimitrios Maroudas

Research output: Contribution to conference › Paper › peer-review

Original language	English (US)
Pages	5150
Number of pages	1
State	Published - 2005
Event	05AIChE: 2005 AIChE Annual Meeting and Fall Showcase - Cincinnati, OH, United States Duration: Oct 30 2005 → Nov 4 2005

Other	05AIChE: 2005 AIChE Annual Meeting and Fall Showcase
Country/Territory	United States
City	Cincinnati, OH
Period	10/30/05 → 11/4/05

ASJC Scopus subject areas

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title = "Atomic-scale analysis of radical precursor and hydrogen surface diffusion on plasma-deposited amorphous silicon thin films",

author = "Valipa, {Mayur S.} and Tamas Bakos and Aydil, {Eray S.} and Dimitrios Maroudas",

year = "2005",

language = "English (US)",

pages = "5150",

note = "05AIChE: 2005 AIChE Annual Meeting and Fall Showcase ; Conference date: 30-10-2005 Through 04-11-2005",

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TY - CONF

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AU - Valipa, Mayur S.

AU - Bakos, Tamas

AU - Aydil, Eray S.

AU - Maroudas, Dimitrios

PY - 2005

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T2 - 05AIChE: 2005 AIChE Annual Meeting and Fall Showcase

Y2 - 30 October 2005 through 4 November 2005

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