Block copolymer lithography: Periodic arrays of ~1011 holes in 1 square centimeter

Miri Park, Christopher Harrison, Paul M. Chaikin, Richard A. Register, Douglas H. Adamson

    Research output: Contribution to journalArticle

    Abstract

    Dense periodic arrays of holes and dots have been fabricated in a silicon nitride-coated silicon wafer. The holes are 20 nanometers across, 40 nanometers apart, and hexagonally ordered with a polygrain structure that has an average grain size of 10 by 10. Spin-coated diblock copolymer thin films with well-ordered spherical or cylindrical microdomains were used as the templates. The microdomain patterns were transferred directly to the underlying silicon nitride layer by two complementary techniques that resulted in opposite tones of the patterns. This process opens a route for nanometer-scale surface patterning by means of spontaneous self-assembly in synthetic materials on length scales that are difficult to obtain by standard semiconductor lithography techniques.

    Original languageEnglish (US)
    Pages (from-to)1401-1404
    Number of pages4
    JournalScience
    Volume276
    Issue number5317
    DOIs
    StatePublished - May 30 1997

    ASJC Scopus subject areas

    • General

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    Park, M., Harrison, C., Chaikin, P. M., Register, R. A., & Adamson, D. H. (1997). Block copolymer lithography: Periodic arrays of ~1011 holes in 1 square centimeter. Science, 276(5317), 1401-1404. https://doi.org/10.1126/science.276.5317.1401