Characterization of Chiral Nanostructured Surfaces Made via Colloidal Lithography

Sabine Portal, Carles Corbella, Oriol Arteaga, Alexander Martin, Trinanjana Mandal, Bart Kahr

Research output: Contribution to journalArticlepeer-review


Optically anisotropic materials were produced via colloidal lithography and characterized using scanning electronic microscopy (SEM), confocal microscopy, and polarimetry. A compact hexagonal array mask composed of silica sub-micron particles was fabricated via the Langmuir–Blodgett self-assembly technique. Subsequently, the mask pattern was transferred onto monocrystalline silicon and commercial glass substrates using ion beam etching in a vacuum. Varying the azimuthal angle while etching at oblique incidence carved screw-like shaped pillars into the substrates, resulting in heterochiral structures depending on the azimuthal angle direction. To enhance the material’s optical properties through plasmon resonance, gold films were deposited onto the pillars. Polarimetric measurements were realized at normal and oblique incidences, showing that the etching directions have a clear influence on the value of the linear birefringence and linear dichroism. The polarimetric properties, especially the chiroptical responses, increased with the increase in the angle of incidence.

Original languageEnglish (US)
Article number2235
Issue number15
StatePublished - Aug 2023


  • chirality
  • colloidal lithography
  • ion beam etching
  • nanostructured surfaces
  • polarimetry

ASJC Scopus subject areas

  • General Chemical Engineering
  • General Materials Science


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