Characterization of X-ray induced damage in alkanethiolate monolayers by high-resolution photoelectron spectroscopy

K. Heister; M. Zharnikov; M. Grunze; L. S.O. Johansson; A. Ulman

doi:10.1021/la001101d

Characterization of X-ray induced damage in alkanethiolate monolayers by high-resolution photoelectron spectroscopy

K. Heister, M. Zharnikov, M. Grunze, L. S.O. Johansson, A. Ulman

Chemical and Biomolecular Engineering

Research output: Contribution to journal › Article › peer-review

Abstract

Synchrotron-based high-resolution X-ray photoelectron spectroscopy was for the first time applied to investigate the damage in self-assembled monolayers (SAMs) of alkanethiols (AT) on Au caused by soft X-rays. The observed changes in AT SAMs and, in particular, the appearance of a new, irradiation-induced sulfur species are identical to those caused by electron bombardment, implying that most of the damage is produced by the photoelectrons and secondary electrons. The irradiation-induced sulfur species is identified as a dialkyl sulfide distributed within the AT film. Only minutes of monochromatized X-ray irradiation at an undulator beamline destroys the AT adlayer completely.

Original language	English (US)
Pages (from-to)	8-11
Number of pages	4
Journal	Langmuir
Volume	17
Issue number	1
DOIs	https://doi.org/10.1021/la001101d
State	Published - Jan 9 2001

ASJC Scopus subject areas

General Materials Science
Condensed Matter Physics
Surfaces and Interfaces
Spectroscopy
Electrochemistry

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abstract = "Synchrotron-based high-resolution X-ray photoelectron spectroscopy was for the first time applied to investigate the damage in self-assembled monolayers (SAMs) of alkanethiols (AT) on Au caused by soft X-rays. The observed changes in AT SAMs and, in particular, the appearance of a new, irradiation-induced sulfur species are identical to those caused by electron bombardment, implying that most of the damage is produced by the photoelectrons and secondary electrons. The irradiation-induced sulfur species is identified as a dialkyl sulfide distributed within the AT film. Only minutes of monochromatized X-ray irradiation at an undulator beamline destroys the AT adlayer completely.",

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AU - Heister, K.

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AU - Ulman, A.

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Characterization of X-ray induced damage in alkanethiolate monolayers by high-resolution photoelectron spectroscopy

Abstract

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