TY - JOUR
T1 - Continuous ultraviolet emissions produced by electron impact on SF 6 and NF3
AU - Jabbour, Z. J.
AU - Blanks, K. A.
AU - Martus, K. E.
AU - Becker, K.
PY - 1987
Y1 - 1987
N2 - We studied the continuous emissions in the wavelength range 2000 to 3400 Å produced by low energy electron impact on SF6 and NF 3. In both cases two different features contribute to the emission spectrum. In NF3, we found a structured emission with maxima at 2880, 3005, and 3130 Å and an onset energy of 8.5±2 eV superimposed on a continuous feature from 2500 to 3500 Å with an onset at about 30 eV. We attribute the structured emission, which has an emission cross section of 2.2×10-19 cm2 at 25 eV, to the NF2 fragment. In SF6, we observed a broad emission feature from 2000 to 3300 Å with maximum intensity at 3010 and 3145 Å with a comparatively weak shoulder at 3160 Å. The 3160 Å feature, which has an emission cross section of about 2×10-20 cm2 at 25 eV, has a single onset at 13.5±1.5 eV, whereas at least two different processes with onsets at 28±2 eV and 42±3 eV, respectively, contribute to the main SF6 emission. The potential relevance of these continuous emissions for diagnostic purposes of NF3 and SF6 processing plasmas utilizing plasma-induced emission spectroscopy and laser-induced fluorescence techniques is discussed.
AB - We studied the continuous emissions in the wavelength range 2000 to 3400 Å produced by low energy electron impact on SF6 and NF 3. In both cases two different features contribute to the emission spectrum. In NF3, we found a structured emission with maxima at 2880, 3005, and 3130 Å and an onset energy of 8.5±2 eV superimposed on a continuous feature from 2500 to 3500 Å with an onset at about 30 eV. We attribute the structured emission, which has an emission cross section of 2.2×10-19 cm2 at 25 eV, to the NF2 fragment. In SF6, we observed a broad emission feature from 2000 to 3300 Å with maximum intensity at 3010 and 3145 Å with a comparatively weak shoulder at 3160 Å. The 3160 Å feature, which has an emission cross section of about 2×10-20 cm2 at 25 eV, has a single onset at 13.5±1.5 eV, whereas at least two different processes with onsets at 28±2 eV and 42±3 eV, respectively, contribute to the main SF6 emission. The potential relevance of these continuous emissions for diagnostic purposes of NF3 and SF6 processing plasmas utilizing plasma-induced emission spectroscopy and laser-induced fluorescence techniques is discussed.
UR - http://www.scopus.com/inward/record.url?scp=36549102519&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=36549102519&partnerID=8YFLogxK
U2 - 10.1063/1.453833
DO - 10.1063/1.453833
M3 - Article
AN - SCOPUS:36549102519
SN - 0021-9606
VL - 88
SP - 4252
EP - 4256
JO - The Journal of Chemical Physics
JF - The Journal of Chemical Physics
IS - 7
ER -