Electron impact ionization of the TiClx (x = 1 - 3) free radicals

V. Tarnovsky, R. Basner, M. Schmidt, K. Becker

Research output: Contribution to journalArticlepeer-review


Titanium tetrachloride (TiCl4) is used for the plasma-assisted chemical vapor deposition of titanium nitride films. We studied the electron impact ionization of TiClx (x = 1 - 3) free radicals, which are abundant constitutents in TiCl4-containing processing plasmas, for electron energies from threshold to 100 eV. Absolute partial cross sections for the formation of all singly charged molecular ions were measured using the fast-beam technique. Dissociative ionization was found to be the dominant process for TiCl3 whereas the formation of the respective parent ions plays a more important role for TiCl2 and TiCl. Total single ionization cross sections for the three radicals could not be determined with reasonable accuracy because of problems in the determination of the cross sections for the formation of the atomic ions Ti+ and Cl+ for the three targets and, as a consequence, no comparison of the measured cross sections with calculated total single ionization cross sections is possible.

Original languageEnglish (US)
Pages (from-to)1-5
Number of pages5
JournalInternational Journal of Mass Spectrometry
Issue number1-3
StatePublished - Jul 18 2001


  • Cross sections
  • Electron impact ionization
  • Plasma deposition
  • Titanium tetrachloride

ASJC Scopus subject areas

  • Instrumentation
  • Condensed Matter Physics
  • Spectroscopy
  • Physical and Theoretical Chemistry


Dive into the research topics of 'Electron impact ionization of the TiClx (x = 1 - 3) free radicals'. Together they form a unique fingerprint.

Cite this