Fabrication of Ni nanocrystal flash memories using a polymeric self-assembly approach

Keyphrases

• Low Aspect Ratio 33%
• Metal Lift-off 33%
• Ni Nanocrystals 100%
• Nickel Nanocrystals 66%
• Pattern Transfer 33%
• PMMA Removal 33%
• Poly-α-methylstyrene 33%
• Polymeric Self-assembly 100%
• Pore Density 33%
• PS Film 33%
• Self-supported Arrays 33%
• Transfer Approach 33%

Material Science

• Block Copolymer 66%
• Density 33%
• Film 33%
• Heat Treatment 33%
• Nanocrystalline Material 100%
• Organic Solvents 33%
• Poly Methyl Methacrylate 33%
• Polystyrene 33%
• Self Assembly 100%