Abstract
The process of fabricating two-dimensional (2D) polymeric photonic crystals with atoms stretched along a specific direction using a double exposure with phase modulation was described. It was found that the crystalline lattices of non-spherical atoms with dielectric materials break the symmetry-indiced degeneracy of polarization modes. The holographic lithography was based on optical interference, which corresponds to the interaction of two or more light waves yielding a resultant irradiance with a periodic spatial modulation. The results show that the holographic lithography is simple, flexible and defect free process to produce twoD photonic crystals over large areas.
| Original language | English (US) |
|---|---|
| Title of host publication | Proceedings of SPIE - The International Society for Optical Engineering |
| Editors | R.M. La Rue, P. Viktorovitch, C.M.S. Torres, M. Midrio |
| Pages | 95-99 |
| Number of pages | 5 |
| Volume | 5450 |
| DOIs | |
| State | Published - 2004 |
| Event | Photonic Crystal Materials and Nanostructures - Strasbourg, France Duration: Apr 27 2004 → Apr 29 2004 |
Other
| Other | Photonic Crystal Materials and Nanostructures |
|---|---|
| Country/Territory | France |
| City | Strasbourg |
| Period | 4/27/04 → 4/29/04 |
Keywords
- Holographic lithography
- Photonic crystals
ASJC Scopus subject areas
- Electrical and Electronic Engineering
- Condensed Matter Physics