Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition

Chao Zhao, M. N. Hedhili, Jingqi Li, Qingxiao Wang, Yang Yang, Long Chen, Liang Li

Research output: Contribution to journalArticlepeer-review

Abstract

The growth of TiO2 films by plasma enhanced atomic layer deposition using Star-Ti as a precursor has been systematically studied. The conversion from amorphous to crystalline TiO2 was observed either during high temperature growth or annealing process of the films. The refractive index and bandgap of TiO2 films changed with the growth and annealing temperatures. The optimization of the annealing conditions for TiO2 films was also done by morphology and density studies.

Original languageEnglish (US)
Pages (from-to)38-44
Number of pages7
JournalThin Solid Films
Volume542
DOIs
StatePublished - Sep 2 2013

Keywords

  • Atomic force microscopy
  • Atomic layer deposition
  • Ellipsometer
  • Raman spectroscopy
  • TiO film
  • X-ray diffraction

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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