High mobility strained Ge MOSFETs with high-k gate dielectric on Si

Joseph P. Donnelly, David Q. Kelly, Sachin Joshi, Sagnik Dey, Davood Shahrjerdi, Issac Wiedeman, Doreen Ahmad, Sanjay K. Banerjee

Research output: Chapter in Book/Report/Conference proceedingConference contribution

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Engineering & Materials Science