Initiated Chemical Vapor Deposition (iCVD) of conformal polymeric nanocoatings for the surface modification of high-aspect-ratio pores

Malancha Gupta, Vivek Kapur, Nathalie M. Pinkerton, Karen K. Gleason

Research output: Contribution to journalArticlepeer-review

Abstract

Initiated chemical vapor deposition (iCVD) was used to coat the surfaces of high-aspect-ratio (∼80:1) pores with functional polymeric films ranging in thickness between 10 and 150 nm. X-ray photoelectron microscopy and electron microprobe analysis confirmed the presence of the polymer coating along the pore wall. Static and dynamic contact angle measurements showed that the iCVD nanocoating altered the surface properties of the pores.

Original languageEnglish (US)
Pages (from-to)1646-1651
Number of pages6
JournalChemistry of Materials
Volume20
Issue number4
DOIs
StatePublished - Feb 26 2008

ASJC Scopus subject areas

  • Chemistry(all)
  • Chemical Engineering(all)
  • Materials Chemistry

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