We present a compact (6.5 x 6.5 μm) silicon photonics design of a 4-way crossing with minimized cross-talk <20 dB in all ports and an area of only 19.86 µm2. The design was realized using gradient descent shape optimization and the adjoint method. It is manufactured using e-beam lithography and characterized for the C- and L-bands.
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Mechanics of Materials