Investigation of diblock copolymer thin film morphology for nanolithography

Miri Park, Christopher Harrison, Paul M. Chaikin, Richard A. Register, Douglas Adamson, Nan Yao

    Research output: Contribution to journalConference article

    Abstract

    The morphologies and ordering in thin polystyrene-polybutadiene (PS-PB) diblock copolymer films are studied on bare silicon and silicon nitride substrates, and also on polymethylmethacrylate (PMMA) coated substrates. The PS-PB copolymers are synthesized to form, in bulk, PB cylinders or spheres in a PS matrix. In thin films, prepared by spin-coating, it is observed that the morphology and ordering of the microdomains are affected by strong wetting constraints and a reduced chain mobility on the substrate. The thinnest self-assembled layer of the copolymer films shows no in-plane microphase separation on both types of substrates. In the case of spherical PS-PB diblock copolymer films, it is observed thatthe ordering of the microdomains is improved in the films on the PMMA substrates, compared to those on the bare substrates. A successful transfer of the microdomain patterns to silicon nitride substrates by a reactive ion etching technique is also demonstrated.

    Original languageEnglish (US)
    Pages (from-to)179-184
    Number of pages6
    JournalMaterials Research Society Symposium - Proceedings
    Volume461
    StatePublished - 1997
    EventProceedings of the 1996 MRS Fall Meeting - Boston, MA, USA
    Duration: Dec 2 1996Dec 6 1996

    ASJC Scopus subject areas

    • Materials Science(all)
    • Condensed Matter Physics
    • Mechanics of Materials
    • Mechanical Engineering

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  • Cite this

    Park, M., Harrison, C., Chaikin, P. M., Register, R. A., Adamson, D., & Yao, N. (1997). Investigation of diblock copolymer thin film morphology for nanolithography. Materials Research Society Symposium - Proceedings, 461, 179-184.