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Investigation of low temperature SiO
2
plasma enhanced chemical vapor deposition
Shashank C. Deshmukh,
Eray S. Aydil
Chemical and Biomolecular Engineering
Research output
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peer-review
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Dive into the research topics of 'Investigation of low temperature SiO
2
plasma enhanced chemical vapor deposition'. Together they form a unique fingerprint.
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Engineering
Low-Temperature
100%
Room Temperature
100%
Chemical Vapor Deposition
100%
Vapor Deposition
100%
Fourier Transform
100%
Refractive Index
50%
Drastic Change
50%
Deposition Rate
50%
Film Property
50%
Film Density
50%
Sio2 Film
50%
Chemistry
Liquid Film
100%
Plasma Enhanced Chemical Vapor Deposition
100%
Ambient Reaction Temperature
50%
Attenuated Total Reflection
50%
Fourier Transform
25%
Refractive Index
25%
Fourier Transform Infrared Spectroscopy
25%
Material Science
Film
100%
Plasma-Enhanced Chemical Vapor Deposition
100%
Density
25%
Oxide Compound
25%
Refractive Index
25%
Fourier Transform Infrared Spectroscopy
25%
Earth and Planetary Sciences
Vapor Deposition
100%
Keyphrases
Fraktur
50%
Infrared Film
50%