Skip to main navigation
Skip to search
Skip to main content
NYU Scholars Home
Help & FAQ
Home
Profiles
Research units
Research output
Search by expertise, name or affiliation
Investigation of low temperature SiO
2
plasma enhanced chemical vapor deposition
Shashank C. Deshmukh,
Eray S. Aydil
Chemical and Biomolecular Engineering
Research output
:
Contribution to journal
›
Article
›
peer-review
Overview
Fingerprint
Fingerprint
Dive into the research topics of 'Investigation of low temperature SiO
2
plasma enhanced chemical vapor deposition'. Together they form a unique fingerprint.
Sort by
Weight
Alphabetically
Engineering
Chemical Vapor Deposition
100%
Deposition Rate
50%
Drastic Change
50%
Film Density
50%
Film Property
50%
Fourier Transform
100%
Low-Temperature
100%
Refractive Index
50%
Room Temperature
100%
Sio2 Film
50%
Vapor Deposition
100%
Chemistry
Ambient Reaction Temperature
50%
Attenuated Total Reflection
50%
Fourier Transform
25%
Fourier Transform Infrared Spectroscopy
25%
Liquid Film
100%
Plasma Enhanced Chemical Vapor Deposition
100%
Refractive Index
25%
Material Science
Density
25%
Film
100%
Fourier Transform Infrared Spectroscopy
25%
Oxide Compound
25%
Plasma-Enhanced Chemical Vapor Deposition
100%
Refractive Index
25%
Earth and Planetary Sciences
Vapor Deposition
100%
Keyphrases
Fraktur
50%
Infrared Film
50%