Isotope effect in adhesion

Gun Young Choi, Abraham Ulman, Yitzhak Shnidman, Walter Zurawsky, Cathy Fleischer

Research output: Contribution to journalArticle

Abstract

We report the first observation of an isotope effect in adhesion. A significant increase in adhesion hysteresis was observed when the OH groups at the -Si-OH and -P(O)(OH)2 surfaces were replaced by OD groups. Our observations support the mechanism of H-bonding with PDMS chains, and also confirm that dissipative processes dominate adhesion and adhesion hysteresis behavior.

Original languageEnglish (US)
Pages (from-to)5768-5771
Number of pages4
JournalJournal of Physical Chemistry B
Volume104
Issue number24
DOIs
StatePublished - Jun 22 2000

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Surfaces, Coatings and Films
  • Materials Chemistry

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  • Cite this

    Choi, G. Y., Ulman, A., Shnidman, Y., Zurawsky, W., & Fleischer, C. (2000). Isotope effect in adhesion. Journal of Physical Chemistry B, 104(24), 5768-5771. https://doi.org/10.1021/jp993268p