Abstract
We report the first observation of an isotope effect in adhesion. A significant increase in adhesion hysteresis was observed when the OH groups at the -Si-OH and -P(O)(OH)2 surfaces were replaced by OD groups. Our observations support the mechanism of H-bonding with PDMS chains, and also confirm that dissipative processes dominate adhesion and adhesion hysteresis behavior.
Original language | English (US) |
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Pages (from-to) | 5768-5771 |
Number of pages | 4 |
Journal | Journal of Physical Chemistry B |
Volume | 104 |
Issue number | 24 |
DOIs | |
State | Published - Jun 22 2000 |
ASJC Scopus subject areas
- Physical and Theoretical Chemistry
- Surfaces, Coatings and Films
- Materials Chemistry