Large-area nanosquare arrays from shear-aligned block copolymer thin films

So Youn Kim, Adam Nunns, Jessica Gwyther, Raleigh L. Davis, Ian Manners, Paul M. Chaikin, Richard A. Register

    Research output: Contribution to journalArticlepeer-review


    While block copolymer lithography has been broadly applied as a bottom-up patterning technique, only a few nanopattern symmetries, such as hexagonally packed dots or parallel stripes, can be produced by spontaneous self-assembly of simple diblock copolymers; even a simple square packing has heretofore required more intricate macromolecular architectures or nanoscale substrate prepatterning. In this study, we demonstrate that square, rectangular, and rhombic arrays can be created via shear-alignment of distinct layers of cylinder-forming block copolymers, coupled with cross-linking of the layers using ultraviolet light. Furthermore, these block copolymer arrays can in turn be used as templates to fabricate dense, substrate-supported arrays of nanostructures comprising a wide variety of elements: deep (>50 nm) nanowells, nanoposts, and thin metal nanodots (3 nm thick, 35 nm pitch) are all demonstrated.

    Original languageEnglish (US)
    Pages (from-to)5698-5705
    Number of pages8
    JournalNano Letters
    Issue number10
    StatePublished - Oct 8 2014


    • Block copolymer lithography
    • metal dots
    • nanopatterning
    • square arrays

    ASJC Scopus subject areas

    • Bioengineering
    • General Chemistry
    • General Materials Science
    • Condensed Matter Physics
    • Mechanical Engineering


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