Large-area, ordered hexagonal arrays of nanoscale holes or dots from block copolymer templates

Josee Vedrine, Young Rae Hong, Andrew P. Marencic, Richard A. Register, Douglas H. Adamson, Paul M. Chaikin

    Research output: Contribution to journalArticle

    Abstract

    Hexagonal arrays of nanoscale holes or metal dots (25 nm in diameter and 39 nm in period), with orientational order extending over the entire square-centimeter array area, were fabricated on unpatterned silicon wafer substrates using a shear-aligned sphere-forming diblock copolymer template. Since two or more layers of spherical nanodomains are required to achieve alignment in the block copolymer film, but pattern transfer requires a single layer, a multistep etching process was developed, whereby the top layer of a shear-aligned bilayer was evenly removed, leaving the ordered bottom layer as the fabrication template for hole and dot arrays free from grain boundaries.

    Original languageEnglish (US)
    Article number143110
    JournalApplied Physics Letters
    Volume91
    Issue number14
    DOIs
    StatePublished - 2007

    ASJC Scopus subject areas

    • Physics and Astronomy (miscellaneous)

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  • Cite this

    Vedrine, J., Hong, Y. R., Marencic, A. P., Register, R. A., Adamson, D. H., & Chaikin, P. M. (2007). Large-area, ordered hexagonal arrays of nanoscale holes or dots from block copolymer templates. Applied Physics Letters, 91(14), [143110]. https://doi.org/10.1063/1.2794010