Local wettability modification by thermochemical nanolithography with write-read-overwrite capability

D. B. Wang; R. Szoszkiewicz; M. Lucas; E. Riedo; T. Okada; S. C. Jones; S. R. Marder; J. Lee; W. P. King

doi:10.1063/1.2816401

Local wettability modification by thermochemical nanolithography with write-read-overwrite capability

D. B. Wang, R. Szoszkiewicz, M. Lucas, E. Riedo, T. Okada, S. C. Jones, S. R. Marder, J. Lee, W. P. King

Chemical and Biomolecular Engineering

Research output: Contribution to journal › Article › peer-review

Abstract

The wettability of a thin polymer film was modified twice by thermochemical nanolithography. By means of a first local chemical modification induced by an atomic force microscope tip heated to 110±20 °C, hydrophilic patterns are written over an originally hydrophobic polymer surface. By further heating to 190±20 °C, a second chemical modification reverses the local wettability change introduced by the first chemical modification. This write-read-overwrite capability can be particularly useful in the design of complex nanofluidic devices.

Original language	English (US)
Article number	243104
Journal	Applied Physics Letters
Volume	91
Issue number	24
DOIs	https://doi.org/10.1063/1.2816401
State	Published - 2007

ASJC Scopus subject areas

Physics and Astronomy (miscellaneous)

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10.1063/1.2816401

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@article{4aae0faed4c445cbb5869688054606b8,

title = "Local wettability modification by thermochemical nanolithography with write-read-overwrite capability",

abstract = "The wettability of a thin polymer film was modified twice by thermochemical nanolithography. By means of a first local chemical modification induced by an atomic force microscope tip heated to 110±20 °C, hydrophilic patterns are written over an originally hydrophobic polymer surface. By further heating to 190±20 °C, a second chemical modification reverses the local wettability change introduced by the first chemical modification. This write-read-overwrite capability can be particularly useful in the design of complex nanofluidic devices.",

author = "Wang, {D. B.} and R. Szoszkiewicz and M. Lucas and E. Riedo and T. Okada and Jones, {S. C.} and Marder, {S. R.} and J. Lee and King, {W. P.}",

note = "Funding Information: This work was supported in part by the STC program of the National Science Foundation under Grant No. DMR-0120967, the COE Cutting Edge Research Award, the DOE (DE-FG02-06ER46293 and PECASE), Georgia Institute of Technology Research Foundation, and ONR Nanoelectronics. We would like to thank Dr. Joseph Perry and Vincent Chen for FTIR measurements.",

year = "2007",

doi = "10.1063/1.2816401",

language = "English (US)",

volume = "91",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics",

number = "24",

}

TY - JOUR

T1 - Local wettability modification by thermochemical nanolithography with write-read-overwrite capability

AU - Wang, D. B.

AU - Szoszkiewicz, R.

AU - Lucas, M.

AU - Riedo, E.

AU - Okada, T.

AU - Jones, S. C.

AU - Marder, S. R.

AU - Lee, J.

AU - King, W. P.

N1 - Funding Information: This work was supported in part by the STC program of the National Science Foundation under Grant No. DMR-0120967, the COE Cutting Edge Research Award, the DOE (DE-FG02-06ER46293 and PECASE), Georgia Institute of Technology Research Foundation, and ONR Nanoelectronics. We would like to thank Dr. Joseph Perry and Vincent Chen for FTIR measurements.

PY - 2007

Y1 - 2007

N2 - The wettability of a thin polymer film was modified twice by thermochemical nanolithography. By means of a first local chemical modification induced by an atomic force microscope tip heated to 110±20 °C, hydrophilic patterns are written over an originally hydrophobic polymer surface. By further heating to 190±20 °C, a second chemical modification reverses the local wettability change introduced by the first chemical modification. This write-read-overwrite capability can be particularly useful in the design of complex nanofluidic devices.

AB - The wettability of a thin polymer film was modified twice by thermochemical nanolithography. By means of a first local chemical modification induced by an atomic force microscope tip heated to 110±20 °C, hydrophilic patterns are written over an originally hydrophobic polymer surface. By further heating to 190±20 °C, a second chemical modification reverses the local wettability change introduced by the first chemical modification. This write-read-overwrite capability can be particularly useful in the design of complex nanofluidic devices.

UR - http://www.scopus.com/inward/record.url?scp=37149025955&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=37149025955&partnerID=8YFLogxK

U2 - 10.1063/1.2816401

DO - 10.1063/1.2816401

M3 - Article

AN - SCOPUS:37149025955

SN - 0003-6951

VL - 91

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 24

M1 - 243104

ER -

Local wettability modification by thermochemical nanolithography with write-read-overwrite capability

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