Local wettability modification by thermochemical nanolithography with write-read-overwrite capability

D. B. Wang, R. Szoszkiewicz, M. Lucas, E. Riedo, T. Okada, S. C. Jones, S. R. Marder, J. Lee, W. P. King

Research output: Contribution to journalArticle

Abstract

The wettability of a thin polymer film was modified twice by thermochemical nanolithography. By means of a first local chemical modification induced by an atomic force microscope tip heated to 110±20 °C, hydrophilic patterns are written over an originally hydrophobic polymer surface. By further heating to 190±20 °C, a second chemical modification reverses the local wettability change introduced by the first chemical modification. This write-read-overwrite capability can be particularly useful in the design of complex nanofluidic devices.

Original languageEnglish (US)
Article number243104
JournalApplied Physics Letters
Volume91
Issue number24
DOIs
StatePublished - Dec 20 2007

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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    Wang, D. B., Szoszkiewicz, R., Lucas, M., Riedo, E., Okada, T., Jones, S. C., Marder, S. R., Lee, J., & King, W. P. (2007). Local wettability modification by thermochemical nanolithography with write-read-overwrite capability. Applied Physics Letters, 91(24), [243104]. https://doi.org/10.1063/1.2816401