Mask strategy and layout decomposition for self-aligned quadruple patterning

Weiling Kang, Chen Feng, Yijian Chen

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Self-aligned quadruple patterning (SAQP) process is a proven technique for deep nano-scale IC manufacturing, while its mask design and layout decomposition strategy is less intuitive. In this paper, we examine both 2- and 3-mask SAQP process characteristics and develop various decomposition methods to achieve higher feature density and 2-D design flexibility. It is demonstrated that by generating assisting mandrels, SAQP layout decomposition can be degenerated into a SADP decomposition problem for which mature algorithms already exist in our EDA industry. Moreover, a spacer-expansion mask concept is introduced and a grouping/coloring algorithm to assign feature colors is developed for 3-mask SAQP layout decomposition. Finally, several 2-D layouts are successfully decomposed, showing the functionality of the decomposition method we proposed.

Original languageEnglish (US)
Title of host publicationDesign for Manufacturability through Design-Process Integration VII
DOIs
StatePublished - 2013
EventSPIE Conference on Designfor Manufacturability through Design-Process Integration, DfM-DPI 2013 - San Jose, CA, United States
Duration: Feb 27 2013Feb 28 2013

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume8684
ISSN (Print)0277-786X

Other

OtherSPIE Conference on Designfor Manufacturability through Design-Process Integration, DfM-DPI 2013
CountryUnited States
CitySan Jose, CA
Period2/27/132/28/13

Keywords

  • Conflicting graph.
  • Layout decomposition/synthesis
  • Negative tone
  • Self-aligned quadruple patterning (SAQP)
  • Spacer-expansion mask

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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  • Cite this

    Kang, W., Feng, C., & Chen, Y. (2013). Mask strategy and layout decomposition for self-aligned quadruple patterning. In Design for Manufacturability through Design-Process Integration VII [86840E] (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 8684). https://doi.org/10.1117/12.2011261