Metal-containing block copolymer thin films yield wire grid polarizers with high aspect ratio

So Youn Kim; Jessica Gwyther; Ian Manners; Paul M. Chaikin; Richard A. Register

doi:10.1002/adma.201303452

Metal-containing block copolymer thin films yield wire grid polarizers with high aspect ratio

So Youn Kim, Jessica Gwyther, Ian Manners, Paul M. Chaikin, Richard A. Register

Research output: Contribution to journal › Article › peer-review

Abstract

Highly selective etch masks are formed by thin films of a polystyrene-b-poly(ferrocenylisopropylmethylsilane) diblock copolymer, PS-PFiPMS, containing hemicylindrical domains of PFiPMS. These domains, with a period of 35 nm, are readily aligned through mechanical shear. Aligned PS-PFiPMS templates are employed to fabricate high-aspect-ratio nanowire grids from amorphous silicon, which can polarize deep ultraviolet radiation, including 193 nm, at >90% efficiency.

Original language	English (US)
Pages (from-to)	791-795
Number of pages	5
Journal	Advanced Materials
Volume	26
Issue number	5
DOIs	https://doi.org/10.1002/adma.201303452
State	Published - Feb 5 2014

Keywords

block copolymer lithography
nanopatterning
wire grid polarizer

ASJC Scopus subject areas

General Materials Science
Mechanics of Materials
Mechanical Engineering

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10.1002/adma.201303452

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@article{9febbbba030c4815bf41fe9f1f957231,

title = "Metal-containing block copolymer thin films yield wire grid polarizers with high aspect ratio",

abstract = "Highly selective etch masks are formed by thin films of a polystyrene-b-poly(ferrocenylisopropylmethylsilane) diblock copolymer, PS-PFiPMS, containing hemicylindrical domains of PFiPMS. These domains, with a period of 35 nm, are readily aligned through mechanical shear. Aligned PS-PFiPMS templates are employed to fabricate high-aspect-ratio nanowire grids from amorphous silicon, which can polarize deep ultraviolet radiation, including 193 nm, at >90% efficiency.",

keywords = "block copolymer lithography, nanopatterning, wire grid polarizer",

author = "Kim, {So Youn} and Jessica Gwyther and Ian Manners and Chaikin, {Paul M.} and Register, {Richard A.}",

year = "2014",

month = feb,

day = "5",

doi = "10.1002/adma.201303452",

language = "English (US)",

volume = "26",

pages = "791--795",

journal = "Advanced Materials",

issn = "0935-9648",

publisher = "Wiley-Blackwell",

number = "5",

}

TY - JOUR

T1 - Metal-containing block copolymer thin films yield wire grid polarizers with high aspect ratio

AU - Kim, So Youn

AU - Gwyther, Jessica

AU - Manners, Ian

AU - Chaikin, Paul M.

AU - Register, Richard A.

PY - 2014/2/5

Y1 - 2014/2/5

N2 - Highly selective etch masks are formed by thin films of a polystyrene-b-poly(ferrocenylisopropylmethylsilane) diblock copolymer, PS-PFiPMS, containing hemicylindrical domains of PFiPMS. These domains, with a period of 35 nm, are readily aligned through mechanical shear. Aligned PS-PFiPMS templates are employed to fabricate high-aspect-ratio nanowire grids from amorphous silicon, which can polarize deep ultraviolet radiation, including 193 nm, at >90% efficiency.

AB - Highly selective etch masks are formed by thin films of a polystyrene-b-poly(ferrocenylisopropylmethylsilane) diblock copolymer, PS-PFiPMS, containing hemicylindrical domains of PFiPMS. These domains, with a period of 35 nm, are readily aligned through mechanical shear. Aligned PS-PFiPMS templates are employed to fabricate high-aspect-ratio nanowire grids from amorphous silicon, which can polarize deep ultraviolet radiation, including 193 nm, at >90% efficiency.

KW - block copolymer lithography

KW - nanopatterning

KW - wire grid polarizer

UR - http://www.scopus.com/inward/record.url?scp=84895060800&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84895060800&partnerID=8YFLogxK

U2 - 10.1002/adma.201303452

DO - 10.1002/adma.201303452

M3 - Article

AN - SCOPUS:84895060800

SN - 0935-9648

VL - 26

SP - 791

EP - 795

JO - Advanced Materials

JF - Advanced Materials

IS - 5

ER -

Metal-containing block copolymer thin films yield wire grid polarizers with high aspect ratio

Abstract

Keywords

ASJC Scopus subject areas

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