Metal-containing block copolymer thin films yield wire grid polarizers with high aspect ratio

So Youn Kim, Jessica Gwyther, Ian Manners, Paul M. Chaikin, Richard A. Register

    Research output: Contribution to journalArticle

    Abstract

    Highly selective etch masks are formed by thin films of a polystyrene-b-poly(ferrocenylisopropylmethylsilane) diblock copolymer, PS-PFiPMS, containing hemicylindrical domains of PFiPMS. These domains, with a period of 35 nm, are readily aligned through mechanical shear. Aligned PS-PFiPMS templates are employed to fabricate high-aspect-ratio nanowire grids from amorphous silicon, which can polarize deep ultraviolet radiation, including 193 nm, at >90% efficiency.

    Original languageEnglish (US)
    Pages (from-to)791-795
    Number of pages5
    JournalAdvanced Materials
    Volume26
    Issue number5
    DOIs
    StatePublished - Feb 5 2014

    Keywords

    • block copolymer lithography
    • nanopatterning
    • wire grid polarizer

    ASJC Scopus subject areas

    • Materials Science(all)
    • Mechanics of Materials
    • Mechanical Engineering

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  • Cite this

    Kim, S. Y., Gwyther, J., Manners, I., Chaikin, P. M., & Register, R. A. (2014). Metal-containing block copolymer thin films yield wire grid polarizers with high aspect ratio. Advanced Materials, 26(5), 791-795. https://doi.org/10.1002/adma.201303452