Mixed-morphology and mixed-orientation block copolymer bilayers

Nicolás A. García, Raleigh L. Davis, So Youn Kim, Paul M. Chaikin, Richard A. Register, Daniel A. Vega

    Research output: Contribution to journalArticle

    Abstract

    Block copolymers have attracted considerable attention due to their ability to self-assemble into highly regular structures, spanning length scales from several nanometers to over 100 nm. Block copolymers confined in thin films have been extensively utilized as soft templates for nanofabrication, but most applications have been restricted to single-layer templates with smectic and hexagonal symmetries. Here we show that a multi-step approach that includes shear alignment, thin film lift-off, and stacking can access novel three-dimensional block copolymer structures with long-range order and mixed symmetries. This technique allows control over the long-range order and also expands the range of nanolithographic templates accessible through guided self-assembly.

    Original languageEnglish (US)
    Pages (from-to)38412-38417
    Number of pages6
    JournalRSC Advances
    Volume4
    Issue number72
    DOIs
    StatePublished - 2014

    ASJC Scopus subject areas

    • Chemistry(all)
    • Chemical Engineering(all)

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  • Cite this

    García, N. A., Davis, R. L., Kim, S. Y., Chaikin, P. M., Register, R. A., & Vega, D. A. (2014). Mixed-morphology and mixed-orientation block copolymer bilayers. RSC Advances, 4(72), 38412-38417. https://doi.org/10.1039/c4ra06764a