Abstract
We present a novel filter for optical emission spectroscopy (OES) data in plasma etch control applications. The filter is based on principal component analysis and jump linear filtering. The filter is demonstrated on a commercial multilayer TiN/Al(0.5% Cu)/TiN/SiO2 etch process.
| Original language | English (US) |
|---|---|
| Title of host publication | Proceedings of the American Control Conference |
| Publisher | IEEE |
| Pages | 627-628 |
| Number of pages | 2 |
| Volume | 1 |
| State | Published - 1997 |
| Event | Proceedings of the 1997 American Control Conference. Part 3 (of 6) - Albuquerque, NM, USA Duration: Jun 4 1997 → Jun 6 1997 |
Other
| Other | Proceedings of the 1997 American Control Conference. Part 3 (of 6) |
|---|---|
| City | Albuquerque, NM, USA |
| Period | 6/4/97 → 6/6/97 |
ASJC Scopus subject areas
- Control and Systems Engineering