Modeling and filtering of optical emission spectroscopy data for plasma etching systems

Sundeep Rangan, Costas Spanos, Kameshwar Poolla

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We present a novel filter for optical emission spectroscopy (OES) data in plasma etch control applications. The filter is based on principal component analysis and jump linear filtering. The filter is demonstrated on a commercial multilayer TiN/Al(0.5% Cu)/TiN/SiO2 etch process.

Original languageEnglish (US)
Title of host publicationProceedings of the American Control Conference
PublisherIEEE
Pages627-628
Number of pages2
Volume1
StatePublished - 1997
EventProceedings of the 1997 American Control Conference. Part 3 (of 6) - Albuquerque, NM, USA
Duration: Jun 4 1997Jun 6 1997

Other

OtherProceedings of the 1997 American Control Conference. Part 3 (of 6)
CityAlbuquerque, NM, USA
Period6/4/976/6/97

ASJC Scopus subject areas

  • Control and Systems Engineering

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