Modeling and filtering of optical emission spectroscopy data for plasma etching systems

Sundeep Rangan; Costas Spanos; Kameshwar Poolla

Modeling and filtering of optical emission spectroscopy data for plasma etching systems

Sundeep Rangan, Costas Spanos, Kameshwar Poolla

Electrical and Computer Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

Full-spectrum in situ optical emission spectroscopy (OES) has emerged as a promising technology for in-line sensor systems for plasma etching process control. In this paper, we present a novel empirical model-based approach for OES data filtering based on statistical principal component analysis and jump linear filtering. The modeling procedure is demonstrated on a commercial multilayer Al/TiN/SiO₂ etch process. For this process, we show that the proposed model provides a succinct representation of the OES signals and is in excellent agreement with the experimental data.

Original language	English (US)
Title of host publication	IEEE International Symposium on Semiconductor Manufacturing Conference, Proceedings
Editors	Anon
Publisher	IEEE
State	Published - 1997
Event	Proceedings of the 1997 IEEE International Symposium on Semiconductor on Manufacturing Conference - San Francisco, CA, USA Duration: Oct 6 1997 → Oct 8 1997

Other

Other	Proceedings of the 1997 IEEE International Symposium on Semiconductor on Manufacturing Conference
City	San Francisco, CA, USA
Period	10/6/97 → 10/8/97

ASJC Scopus subject areas

Electrical and Electronic Engineering
Industrial and Manufacturing Engineering

Cite this

@inproceedings{ff1d67e12c9946eebecd07a6585e0a23,

title = "Modeling and filtering of optical emission spectroscopy data for plasma etching systems",

abstract = "Full-spectrum in situ optical emission spectroscopy (OES) has emerged as a promising technology for in-line sensor systems for plasma etching process control. In this paper, we present a novel empirical model-based approach for OES data filtering based on statistical principal component analysis and jump linear filtering. The modeling procedure is demonstrated on a commercial multilayer Al/TiN/SiO2 etch process. For this process, we show that the proposed model provides a succinct representation of the OES signals and is in excellent agreement with the experimental data.",

author = "Sundeep Rangan and Costas Spanos and Kameshwar Poolla",

year = "1997",

language = "English (US)",

editor = "Anon",

booktitle = "IEEE International Symposium on Semiconductor Manufacturing Conference, Proceedings",

publisher = "IEEE",

note = "Proceedings of the 1997 IEEE International Symposium on Semiconductor on Manufacturing Conference ; Conference date: 06-10-1997 Through 08-10-1997",

}

TY - GEN

T1 - Modeling and filtering of optical emission spectroscopy data for plasma etching systems

AU - Rangan, Sundeep

AU - Spanos, Costas

AU - Poolla, Kameshwar

PY - 1997

Y1 - 1997

N2 - Full-spectrum in situ optical emission spectroscopy (OES) has emerged as a promising technology for in-line sensor systems for plasma etching process control. In this paper, we present a novel empirical model-based approach for OES data filtering based on statistical principal component analysis and jump linear filtering. The modeling procedure is demonstrated on a commercial multilayer Al/TiN/SiO2 etch process. For this process, we show that the proposed model provides a succinct representation of the OES signals and is in excellent agreement with the experimental data.

AB - Full-spectrum in situ optical emission spectroscopy (OES) has emerged as a promising technology for in-line sensor systems for plasma etching process control. In this paper, we present a novel empirical model-based approach for OES data filtering based on statistical principal component analysis and jump linear filtering. The modeling procedure is demonstrated on a commercial multilayer Al/TiN/SiO2 etch process. For this process, we show that the proposed model provides a succinct representation of the OES signals and is in excellent agreement with the experimental data.

UR - http://www.scopus.com/inward/record.url?scp=0031386582&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0031386582&partnerID=8YFLogxK

M3 - Conference contribution

AN - SCOPUS:0031386582

BT - IEEE International Symposium on Semiconductor Manufacturing Conference, Proceedings

A2 - Anon, null

PB - IEEE

T2 - Proceedings of the 1997 IEEE International Symposium on Semiconductor on Manufacturing Conference

Y2 - 6 October 1997 through 8 October 1997

ER -

Modeling and filtering of optical emission spectroscopy data for plasma etching systems

Abstract

Other

ASJC Scopus subject areas

Other files and links

Fingerprint

Cite this