Modeling and filtering of optical emission spectroscopy data for plasma etching systems

Sundeep Rangan, Costas Spanos, Kameshwar Poolla

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Full-spectrum in situ optical emission spectroscopy (OES) has emerged as a promising technology for in-line sensor systems for plasma etching process control. In this paper, we present a novel empirical model-based approach for OES data filtering based on statistical principal component analysis and jump linear filtering. The modeling procedure is demonstrated on a commercial multilayer Al/TiN/SiO2 etch process. For this process, we show that the proposed model provides a succinct representation of the OES signals and is in excellent agreement with the experimental data.

Original languageEnglish (US)
Title of host publicationIEEE International Symposium on Semiconductor Manufacturing Conference, Proceedings
Editors Anon
PublisherIEEE
StatePublished - 1997
EventProceedings of the 1997 IEEE International Symposium on Semiconductor on Manufacturing Conference - San Francisco, CA, USA
Duration: Oct 6 1997Oct 8 1997

Other

OtherProceedings of the 1997 IEEE International Symposium on Semiconductor on Manufacturing Conference
CitySan Francisco, CA, USA
Period10/6/9710/8/97

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Industrial and Manufacturing Engineering

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