Abstract
We develop a new approach to the modeling of thin film growth. Our model treats the adatom density on the surface of the film as an explicit unknown. This approach (1) clarifies the role of the "uphill current" associated with the Schwoebel barrier; (2) facilitates simple, physically natural coupling to the mechanism of deposition; and (3) permits discussion of multispecies effects. Our implementation focuses on spiral mode growth of YBCO thin films, with MOCVD (metallorganic chemical vapor deposition) as the deposition mechanism.
Original language | English (US) |
---|---|
Pages (from-to) | P6491-P6497 |
Journal | Materials Research Society Symposium - Proceedings |
Volume | 648 |
State | Published - 2001 |
Event | Growth, Evolution and Properties of Surfaces, Thin Films and Self-Organized Strutures - Boston, MA, United States Duration: Nov 27 2000 → Dec 1 2000 |
ASJC Scopus subject areas
- General Materials Science
- Condensed Matter Physics
- Mechanics of Materials
- Mechanical Engineering