Molecular dynamics study of the interactions of small thermal and energetic silicon clusters with crystalline and amorphous silicon surfaces

Shyam Ramalingam; Eray S. Aydil; Dimitrios Maroudas

doi:10.1116/1.1362682

Molecular dynamics study of the interactions of small thermal and energetic silicon clusters with crystalline and amorphous silicon surfaces

Shyam Ramalingam, Eray S. Aydil, Dimitrios Maroudas

Chemical and Biomolecular Engineering

Research output: Contribution to journal › Conference article › peer-review

Abstract

The interactions of small thermal and energetic silicon clusters with crystalline and amorphous silicon surfaces observed in various plasmas were studied using molecular dynamics. Hydrogenated amorphous silicon film growth rates were obtained by employing a unit reaction probability for clusters of different sizes on silicon surfaces. Results showed that the clusters react with surface of amorphous silicon films and crystalline surfaces with high probability. The energetics and structures of adsorbed cluster configurations on these surfaces were also analyzed.

Original language	English (US)
Pages (from-to)	634-644
Number of pages	11
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	19
Issue number	3
DOIs	https://doi.org/10.1116/1.1362682
State	Published - 2001
Event	13th International Vaccum Microelectronics Conference - Guangzhou, China Duration: Aug 14 2000 → Aug 17 2000

ASJC Scopus subject areas

Condensed Matter Physics
Electrical and Electronic Engineering

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10.1116/1.1362682

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Molecular dynamics study of the interactions of small thermal and energetic silicon clusters with crystalline and amorphous silicon surfaces. / Ramalingam, Shyam; Aydil, Eray S.; Maroudas, Dimitrios.
In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Vol. 19, No. 3, 2001, p. 634-644.

Research output: Contribution to journal › Conference article › peer-review

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abstract = "The interactions of small thermal and energetic silicon clusters with crystalline and amorphous silicon surfaces observed in various plasmas were studied using molecular dynamics. Hydrogenated amorphous silicon film growth rates were obtained by employing a unit reaction probability for clusters of different sizes on silicon surfaces. Results showed that the clusters react with surface of amorphous silicon films and crystalline surfaces with high probability. The energetics and structures of adsorbed cluster configurations on these surfaces were also analyzed.",

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AU - Aydil, Eray S.

AU - Maroudas, Dimitrios

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Y1 - 2001

N2 - The interactions of small thermal and energetic silicon clusters with crystalline and amorphous silicon surfaces observed in various plasmas were studied using molecular dynamics. Hydrogenated amorphous silicon film growth rates were obtained by employing a unit reaction probability for clusters of different sizes on silicon surfaces. Results showed that the clusters react with surface of amorphous silicon films and crystalline surfaces with high probability. The energetics and structures of adsorbed cluster configurations on these surfaces were also analyzed.

AB - The interactions of small thermal and energetic silicon clusters with crystalline and amorphous silicon surfaces observed in various plasmas were studied using molecular dynamics. Hydrogenated amorphous silicon film growth rates were obtained by employing a unit reaction probability for clusters of different sizes on silicon surfaces. Results showed that the clusters react with surface of amorphous silicon films and crystalline surfaces with high probability. The energetics and structures of adsorbed cluster configurations on these surfaces were also analyzed.

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T2 - 13th International Vaccum Microelectronics Conference

Y2 - 14 August 2000 through 17 August 2000

ER -

Molecular dynamics study of the interactions of small thermal and energetic silicon clusters with crystalline and amorphous silicon surfaces

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