Monte Carlo simulation and experimental study of an electron cyclotron resonance plasma for thin film deposition

E. Koretzky, S. P. Kuo, S. C. Kuo

Research output: Contribution to journalConference article

Abstract

Monte Carlo simulation of electron behavior in an ECR (electron cyclotron resonance) microwave discharge maintained by the TM11 mode field of a cylindrical waveguide has been performed. Results show that at low pressure, the temperature of the tail portion of the FED (electron energy distribution) exceeds 40eV, and the sheath potential is about -200V. These results are about twice as high as the previous results using TM01 mode fields. The produced ECR plasma is aimed at assisting the growth of polycrystalline diamond films and DLC films.

Original languageEnglish (US)
Number of pages1
JournalIEEE International Conference on Plasma Science
StatePublished - 1996
EventProceedings of the 1996 IEEE International Conference on Plasma Science - Boston, MA, USA
Duration: Jun 3 1996Jun 5 1996

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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