Monte Carlo simulation and experimental study of an electron cyclotron resonance plasma for thin film deposition

E. Koretzky; S. P. Kuo; S. C. Kuo

Monte Carlo simulation and experimental study of an electron cyclotron resonance plasma for thin film deposition

E. Koretzky, S. P. Kuo, S. C. Kuo

Electrical and Computer Engineering

Research output: Contribution to journal › Conference article › peer-review

Abstract

Monte Carlo simulation of electron behavior in an ECR (electron cyclotron resonance) microwave discharge maintained by the TM₁₁ mode field of a cylindrical waveguide has been performed. Results show that at low pressure, the temperature of the tail portion of the FED (electron energy distribution) exceeds 40eV, and the sheath potential is about -200V. These results are about twice as high as the previous results using TM₀₁ mode fields. The produced ECR plasma is aimed at assisting the growth of polycrystalline diamond films and DLC films.

Original language	English (US)
Pages (from-to)	137
Number of pages	1
Journal	IEEE International Conference on Plasma Science
State	Published - 1996
Event	Proceedings of the 1996 IEEE International Conference on Plasma Science - Boston, MA, USA Duration: Jun 3 1996 → Jun 5 1996

ASJC Scopus subject areas

Atomic and Molecular Physics, and Optics
Condensed Matter Physics
Electrical and Electronic Engineering

Cite this

@article{acef3e947bad4ef8af3d8cae7a35f580,

title = "Monte Carlo simulation and experimental study of an electron cyclotron resonance plasma for thin film deposition",

abstract = "Monte Carlo simulation of electron behavior in an ECR (electron cyclotron resonance) microwave discharge maintained by the TM11 mode field of a cylindrical waveguide has been performed. Results show that at low pressure, the temperature of the tail portion of the FED (electron energy distribution) exceeds 40eV, and the sheath potential is about -200V. These results are about twice as high as the previous results using TM01 mode fields. The produced ECR plasma is aimed at assisting the growth of polycrystalline diamond films and DLC films.",

author = "E. Koretzky and Kuo, {S. P.} and Kuo, {S. C.}",

year = "1996",

language = "English (US)",

pages = "137",

journal = "IEEE International Conference on Plasma Science",

issn = "0730-9244",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

note = "Proceedings of the 1996 IEEE International Conference on Plasma Science ; Conference date: 03-06-1996 Through 05-06-1996",

}

TY - JOUR

T1 - Monte Carlo simulation and experimental study of an electron cyclotron resonance plasma for thin film deposition

AU - Koretzky, E.

AU - Kuo, S. P.

AU - Kuo, S. C.

PY - 1996

Y1 - 1996

N2 - Monte Carlo simulation of electron behavior in an ECR (electron cyclotron resonance) microwave discharge maintained by the TM11 mode field of a cylindrical waveguide has been performed. Results show that at low pressure, the temperature of the tail portion of the FED (electron energy distribution) exceeds 40eV, and the sheath potential is about -200V. These results are about twice as high as the previous results using TM01 mode fields. The produced ECR plasma is aimed at assisting the growth of polycrystalline diamond films and DLC films.

AB - Monte Carlo simulation of electron behavior in an ECR (electron cyclotron resonance) microwave discharge maintained by the TM11 mode field of a cylindrical waveguide has been performed. Results show that at low pressure, the temperature of the tail portion of the FED (electron energy distribution) exceeds 40eV, and the sheath potential is about -200V. These results are about twice as high as the previous results using TM01 mode fields. The produced ECR plasma is aimed at assisting the growth of polycrystalline diamond films and DLC films.

UR - http://www.scopus.com/inward/record.url?scp=0029700229&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0029700229&partnerID=8YFLogxK

M3 - Conference article

AN - SCOPUS:0029700229

SN - 0730-9244

SP - 137

JO - IEEE International Conference on Plasma Science

JF - IEEE International Conference on Plasma Science

T2 - Proceedings of the 1996 IEEE International Conference on Plasma Science

Y2 - 3 June 1996 through 5 June 1996

ER -

Monte Carlo simulation and experimental study of an electron cyclotron resonance plasma for thin film deposition

Abstract

ASJC Scopus subject areas

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