Multiple-exposure holographic lithography with phase shift

Jun Hyuk Moon; Seung Man Yang; David J. Pine; Won Seok Chang

doi:10.1063/1.1813644

Multiple-exposure holographic lithography with phase shift

Jun Hyuk Moon, Seung Man Yang, David J. Pine, Won Seok Chang

Chemical and Biomolecular Engineering

Research output: Contribution to journal › Article › peer-review

Abstract

We demonstrated a multiple-exposure holographic lithography with phase shift. The phase shift was utilized to translate two-dimensional (2D) and three-dimensional (3D) interference patterns. The multiple exposure of the interference patterns with a controlled phase shift created partially overlapped patterns, resulting in 2D and 3D polymer lattices of shape-anisotropic atoms. This approach can be used to design directly the unit atoms in periodic patterns for tunable optical properties.

Original language	English (US)
Pages (from-to)	4184-4186
Number of pages	3
Journal	Applied Physics Letters
Volume	85
Issue number	18
DOIs	https://doi.org/10.1063/1.1813644
State	Published - Nov 1 2004

ASJC Scopus subject areas

Physics and Astronomy (miscellaneous)

Access to Document

10.1063/1.1813644

Cite this

@article{65ba2af7f9b54598afe84e61ed40605a,

title = "Multiple-exposure holographic lithography with phase shift",

abstract = "We demonstrated a multiple-exposure holographic lithography with phase shift. The phase shift was utilized to translate two-dimensional (2D) and three-dimensional (3D) interference patterns. The multiple exposure of the interference patterns with a controlled phase shift created partially overlapped patterns, resulting in 2D and 3D polymer lattices of shape-anisotropic atoms. This approach can be used to design directly the unit atoms in periodic patterns for tunable optical properties.",

author = "Moon, {Jun Hyuk} and Yang, {Seung Man} and Pine, {David J.} and Chang, {Won Seok}",

note = "Funding Information: This work was supported by the “National R&D Project for Nano Science and Technology” of the Ministry of Science and Technology, Center for Nanoscale Mechatronics (M102KN010001-02K1401-00212), BK21 program, and CUPS-ERC. D.J.P. acknowledges support from the U.S. National Science Foundation (Grant No. CTS-0221809).",

year = "2004",

month = nov,

day = "1",

doi = "10.1063/1.1813644",

language = "English (US)",

volume = "85",

pages = "4184--4186",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics Publising LLC",

number = "18",

}

TY - JOUR

T1 - Multiple-exposure holographic lithography with phase shift

AU - Moon, Jun Hyuk

AU - Yang, Seung Man

AU - Pine, David J.

AU - Chang, Won Seok

N1 - Funding Information: This work was supported by the “National R&D Project for Nano Science and Technology” of the Ministry of Science and Technology, Center for Nanoscale Mechatronics (M102KN010001-02K1401-00212), BK21 program, and CUPS-ERC. D.J.P. acknowledges support from the U.S. National Science Foundation (Grant No. CTS-0221809).

PY - 2004/11/1

Y1 - 2004/11/1

N2 - We demonstrated a multiple-exposure holographic lithography with phase shift. The phase shift was utilized to translate two-dimensional (2D) and three-dimensional (3D) interference patterns. The multiple exposure of the interference patterns with a controlled phase shift created partially overlapped patterns, resulting in 2D and 3D polymer lattices of shape-anisotropic atoms. This approach can be used to design directly the unit atoms in periodic patterns for tunable optical properties.

AB - We demonstrated a multiple-exposure holographic lithography with phase shift. The phase shift was utilized to translate two-dimensional (2D) and three-dimensional (3D) interference patterns. The multiple exposure of the interference patterns with a controlled phase shift created partially overlapped patterns, resulting in 2D and 3D polymer lattices of shape-anisotropic atoms. This approach can be used to design directly the unit atoms in periodic patterns for tunable optical properties.

UR - http://www.scopus.com/inward/record.url?scp=10044226235&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=10044226235&partnerID=8YFLogxK

U2 - 10.1063/1.1813644

DO - 10.1063/1.1813644

M3 - Article

AN - SCOPUS:10044226235

SN - 0003-6951

VL - 85

SP - 4184

EP - 4186

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 18

ER -

Multiple-exposure holographic lithography with phase shift

Abstract

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this