We demonstrated a multiple-exposure holographic lithography with phase shift. The phase shift was utilized to translate two-dimensional (2D) and three-dimensional (3D) interference patterns. The multiple exposure of the interference patterns with a controlled phase shift created partially overlapped patterns, resulting in 2D and 3D polymer lattices of shape-anisotropic atoms. This approach can be used to design directly the unit atoms in periodic patterns for tunable optical properties.
|Original language||English (US)|
|Number of pages||3|
|Journal||Applied Physics Letters|
|State||Published - Nov 1 2004|
ASJC Scopus subject areas
- Physics and Astronomy (miscellaneous)