Multiple steady states in electron cyclotron resonance plasma reactors

Engineering & Materials Science

• Electron cyclotron resonance 100%
• Plasmas 51%
• Langmuir probes 9%
• Charge density 7%
• Linewidth 6%
• Etching 5%
• Microelectronics 5%
• Wave propagation 5%
• Thin films 4%
• Microwaves 4%
• Magnetic fields 4%
• Flow rate 3%
• Substrates 3%
• Industry 2%

Physics & Astronomy

• electron cyclotron resonance 60%
• reactors 42%
• hysteresis 8%
• platens 8%
• plasma currents 6%
• electrostatic probes 6%
• microelectronics 5%
• floating 5%
• selectivity 5%
• wave propagation 4%
• industries 4%
• manufacturing 4%
• flow velocity 4%
• etching 4%
• deviation 3%
• microwaves 3%
• causes 3%
• profiles 3%
• thin films 2%
• magnetic fields 2%

Chemical Compounds

• Plasma 34%
• Hysteresis 12%
• Microelectronics 6%
• Charge Density 5%
• Magnetic Field 5%
• Etching 5%
• Flow Kinetics 4%
• Industry 4%
• Probe 3%
• Pressure 3%