Negative domain wall contribution to the resistivity of microfabricated fe wires

U. Ruediger, J. Yu, S. Zhang, A. D. Kent

    Research output: Contribution to journalArticlepeer-review

    Abstract

    The effect of domain walls on electron transport has been investigated in microfabricated Fe wires (0.65 to 20 μm linewidths) with controlled stripe domains. Magnetoresistance (MR) measurements as a function of domain wall density, temperature, and the angle of the applied field are used to determine the low field MR contributions due to conventional sources in ferromagnetic materials and that due to the erasure of domain walls. A negative domain wall contribution to the resistivity is found. This result is discussed in light of a recent theoretical study of the effect of domain walls on quantum transport.

    Original languageEnglish (US)
    Pages (from-to)5639-5642
    Number of pages4
    JournalPhysical Review Letters
    Volume80
    Issue number25
    DOIs
    StatePublished - 1998

    ASJC Scopus subject areas

    • Physics and Astronomy(all)

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