New designer dielectric metamaterial with isotropic photonic band gap

Geev Nahal, Weining Man, Marian Florescu, Paul J. Steinhardt, Sal Torquato, Paul M. Chaikin, Ruth Ann Mullen

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    Abstract

    A new designer dielectric metamaterial featuring an isotropic photonic bandgap at 1550 nm wavelength designed as a finite thickness, 220 nm thick 2d slab, is fabricated in a CMOS-compatible silicon-on-insulator process. This 'hyperuniform disordered solid' (HUDS) is neither crystalline nor quasicrystalline.

    Original languageEnglish (US)
    Title of host publication2013 IEEE Photonics Conference, IPC 2013
    Pages480-482
    Number of pages3
    DOIs
    StatePublished - 2013
    Event2013 26th IEEE Photonics Conference, IPC 2013 - Bellevue, WA, United States
    Duration: Sep 8 2013Sep 12 2013

    Publication series

    Name2013 IEEE Photonics Conference, IPC 2013

    Other

    Other2013 26th IEEE Photonics Conference, IPC 2013
    CountryUnited States
    CityBellevue, WA
    Period9/8/139/12/13

    Keywords

    • HUDS
    • hyperuniform disordered solid
    • hyperuniform disordered structure
    • metamaterial
    • photonic band gap
    • siliconon-insulator

    ASJC Scopus subject areas

    • Instrumentation

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