On the utility of Run to Run control in semiconductor manufacturing

John Musacchio, Sundeep Rangan, Costas Spanos, Kameshwar Poolla

Research output: Contribution to journalConference article

Abstract

Run to Run (RTR) control uses data from past process runs to adjust settings for the next run. By making better use of existing in-line metrology and actuation capabilities, RTR control offers the potential of reducing variability in manufacturing with minimal capital cost. In this paper, we survey the types of equipment models that Can be used for RTR control, compare existing RTR control algorithms, and discuss issues affecting the potential utility of RTR control.

Original languageEnglish (US)
Pages (from-to)D9-D12
JournalIEEE International Symposium on Semiconductor Manufacturing Conference, Proceedings
StatePublished - 1997
EventProceedings of the 1997 IEEE International Symposium on Semiconductor on Manufacturing Conference - San Francisco, CA, USA
Duration: Oct 6 1997Oct 8 1997

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Engineering(all)
  • Industrial and Manufacturing Engineering
  • Electrical and Electronic Engineering

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