Abstract
Run to Run (RTR) control uses data from past process runs to adjust settings for the next run. By making better use of existing in-line metrology and actuation capabilities, RTR control offers the potential of reducing variability in manufacturing with minimal capital cost. In this paper, we survey the types of equipment models that Can be used for RTR control, compare existing RTR control algorithms, and discuss issues affecting the potential utility of RTR control.
| Original language | English (US) |
|---|---|
| Pages (from-to) | D9-D12 |
| Journal | IEEE International Symposium on Semiconductor Manufacturing Conference, Proceedings |
| State | Published - 1997 |
| Event | Proceedings of the 1997 IEEE International Symposium on Semiconductor on Manufacturing Conference - San Francisco, CA, USA Duration: Oct 6 1997 → Oct 8 1997 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- General Engineering
- Industrial and Manufacturing Engineering
- Electrical and Electronic Engineering