We report on the fabrication of large-area microspirals in SU8 photoresist using a 6 + 1 beam holographic lithography (HL) technique involving the interference of six linearly polarized side beams and one circularly polarized central beam. In contrast to common photoresist-substrate (glass) configuration, the spirals are fabricated on a substrate with a precured thin SU8 photoresist. This SU8-SU8-glass configuration strengthens the attachment of the spirals to the substrate, and hence enhances the quality of the fabricated spirals. The fabricated SU8 microspirals exhibit large optical activities with a polarization rotation close to 10 deg and a circular dichroism of about 0.5 in the visible range. Our precured substrate method could lift the limitations of the HL method in fabricating large and uniform microstructures or nanostructures.
ASJC Scopus subject areas
- Atomic and Molecular Physics, and Optics
- Engineering (miscellaneous)
- Electrical and Electronic Engineering