TY - GEN
T1 - Ordered configuration of strained ge nanostructures on si using mechanical nano-stamping
T2 - CLEO: Science and Innovations, CLEO_SI 2020
AU - Dushaq, Ghada
AU - Rasras, Mahmoud
N1 - Publisher Copyright:
© OSA 2020 © 2020 The Author(s)
PY - 2020
Y1 - 2020
N2 - Highly tensile-strained Ge nanostructures grown on pre-patterned (001) Si substrate is demonstrated. Using depth controlled nanoindentation, 2.7% strain value has been obtained. Results are verified by observing photoluminescence emission properties of the Ge/Si nanostructures.
AB - Highly tensile-strained Ge nanostructures grown on pre-patterned (001) Si substrate is demonstrated. Using depth controlled nanoindentation, 2.7% strain value has been obtained. Results are verified by observing photoluminescence emission properties of the Ge/Si nanostructures.
UR - http://www.scopus.com/inward/record.url?scp=85095420522&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=85095420522&partnerID=8YFLogxK
U2 - 10.1364/CLEO_SI.2020.STh4H.3
DO - 10.1364/CLEO_SI.2020.STh4H.3
M3 - Conference contribution
AN - SCOPUS:85095420522
SN - 9781943580767
T3 - Optics InfoBase Conference Papers
BT - CLEO
PB - Optica Publishing Group (formerly OSA)
Y2 - 10 May 2020 through 15 May 2020
ER -