Patterned polymer photonic crystals using soft lithography and holographic lithography

Jun Hyuk Moon, Alex Small, Gi Ra Yi, Seung Kon Lee, Won Seok Chang, David J. Pine, Seung Man Yang

Research output: Contribution to journalArticle

Abstract

We fabricated patterned polymer photonic crystals by holographic lithography in conjunction with soft lithography. A patterned SU-8 photoresist film was created by preformed pattern of a hard-baked SU-8 photoresist, transferred by a PDMS mold. Then, four-beam holographic exposure carved 3D photonic crystal structures onto the patterned photoresist. Because of refractive index matching of the photoresist and the hard-baked photoresist, scattering, which might have caused a distortion of interference pattern, did not occur. Eventually, an f.c.c. polymer structure with a line pattern was successfully created after development.

Original languageEnglish (US)
Pages (from-to)99-102
Number of pages4
JournalSynthetic Metals
Volume148
Issue number1
DOIs
StatePublished - Jan 3 2005

Keywords

  • Holographic lithography
  • Photonic crystals
  • SU-8 photoresist
  • Scattering
  • Soft lithography

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering
  • Metals and Alloys
  • Materials Chemistry

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