Patterned polymer photonic crystals using soft lithography and holographic lithography

Jun Hyuk Moon; Alex Small; Gi Ra Yi; Seung Kon Lee; Won Seok Chang; David J. Pine; Seung Man Yang

doi:10.1016/j.synthmet.2004.09.019

Patterned polymer photonic crystals using soft lithography and holographic lithography

Jun Hyuk Moon, Alex Small, Gi Ra Yi, Seung Kon Lee, Won Seok Chang, David J. Pine, Seung Man Yang

Chemical and Biomolecular Engineering

Research output: Contribution to journal › Article › peer-review

Abstract

We fabricated patterned polymer photonic crystals by holographic lithography in conjunction with soft lithography. A patterned SU-8 photoresist film was created by preformed pattern of a hard-baked SU-8 photoresist, transferred by a PDMS mold. Then, four-beam holographic exposure carved 3D photonic crystal structures onto the patterned photoresist. Because of refractive index matching of the photoresist and the hard-baked photoresist, scattering, which might have caused a distortion of interference pattern, did not occur. Eventually, an f.c.c. polymer structure with a line pattern was successfully created after development.

Original language	English (US)
Pages (from-to)	99-102
Number of pages	4
Journal	Synthetic Metals
Volume	148
Issue number	1
DOIs	https://doi.org/10.1016/j.synthmet.2004.09.019
State	Published - Jan 3 2005

Keywords

Holographic lithography
Photonic crystals
SU-8 photoresist
Scattering
Soft lithography

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Mechanics of Materials
Mechanical Engineering
Metals and Alloys
Materials Chemistry

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10.1016/j.synthmet.2004.09.019

Cite this

@article{04571264263a45f0a3a8ea9ecefe004c,

title = "Patterned polymer photonic crystals using soft lithography and holographic lithography",

abstract = "We fabricated patterned polymer photonic crystals by holographic lithography in conjunction with soft lithography. A patterned SU-8 photoresist film was created by preformed pattern of a hard-baked SU-8 photoresist, transferred by a PDMS mold. Then, four-beam holographic exposure carved 3D photonic crystal structures onto the patterned photoresist. Because of refractive index matching of the photoresist and the hard-baked photoresist, scattering, which might have caused a distortion of interference pattern, did not occur. Eventually, an f.c.c. polymer structure with a line pattern was successfully created after development.",

keywords = "Holographic lithography, Photonic crystals, SU-8 photoresist, Scattering, Soft lithography",

author = "Moon, {Jun Hyuk} and Alex Small and Yi, {Gi Ra} and Lee, {Seung Kon} and Chang, {Won Seok} and Pine, {David J.} and Yang, {Seung Man}",

note = "Funding Information: This work was supported by the “National R6D Project for Nano Science and Technology” of the Ministry of Science and Technology, Center for Nanoscale Mechatronics (M102KN010001-02K1401-00212), BK 21 program and CUPS-ERC. DJP acknowledges support from the U.S. National Science Foundation (Grant No. CTS-0221809).",

year = "2005",

month = jan,

day = "3",

doi = "10.1016/j.synthmet.2004.09.019",

language = "English (US)",

volume = "148",

pages = "99--102",

journal = "Synthetic Metals",

issn = "0379-6779",

publisher = "Elsevier B.V.",

number = "1",

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TY - JOUR

T1 - Patterned polymer photonic crystals using soft lithography and holographic lithography

AU - Moon, Jun Hyuk

AU - Small, Alex

AU - Yi, Gi Ra

AU - Lee, Seung Kon

AU - Chang, Won Seok

AU - Pine, David J.

AU - Yang, Seung Man

N1 - Funding Information: This work was supported by the “National R6D Project for Nano Science and Technology” of the Ministry of Science and Technology, Center for Nanoscale Mechatronics (M102KN010001-02K1401-00212), BK 21 program and CUPS-ERC. DJP acknowledges support from the U.S. National Science Foundation (Grant No. CTS-0221809).

PY - 2005/1/3

Y1 - 2005/1/3

N2 - We fabricated patterned polymer photonic crystals by holographic lithography in conjunction with soft lithography. A patterned SU-8 photoresist film was created by preformed pattern of a hard-baked SU-8 photoresist, transferred by a PDMS mold. Then, four-beam holographic exposure carved 3D photonic crystal structures onto the patterned photoresist. Because of refractive index matching of the photoresist and the hard-baked photoresist, scattering, which might have caused a distortion of interference pattern, did not occur. Eventually, an f.c.c. polymer structure with a line pattern was successfully created after development.

AB - We fabricated patterned polymer photonic crystals by holographic lithography in conjunction with soft lithography. A patterned SU-8 photoresist film was created by preformed pattern of a hard-baked SU-8 photoresist, transferred by a PDMS mold. Then, four-beam holographic exposure carved 3D photonic crystal structures onto the patterned photoresist. Because of refractive index matching of the photoresist and the hard-baked photoresist, scattering, which might have caused a distortion of interference pattern, did not occur. Eventually, an f.c.c. polymer structure with a line pattern was successfully created after development.

KW - Holographic lithography

KW - Photonic crystals

KW - SU-8 photoresist

KW - Scattering

KW - Soft lithography

UR - http://www.scopus.com/inward/record.url?scp=10444259921&partnerID=8YFLogxK

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U2 - 10.1016/j.synthmet.2004.09.019

DO - 10.1016/j.synthmet.2004.09.019

M3 - Article

AN - SCOPUS:10444259921

SN - 0379-6779

VL - 148

SP - 99

EP - 102

JO - Synthetic Metals

JF - Synthetic Metals

IS - 1

ER -

Patterned polymer photonic crystals using soft lithography and holographic lithography

Abstract

Keywords

ASJC Scopus subject areas

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