Patterning nano-square arrays using shear-aligned block copolymer thin films

S. Y. Kim, R. L. Davis, B. T. Michal, J. Gwyther, I. Manners, P. M. Chaikin, R. A. Register

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    Original languageEnglish (US)
    Title of host publicationEngineering Sciences and Fundamentals 2013 - Core Programming Area at the 2013 AIChE Annual Meeting
    Subtitle of host publicationGlobal Challenges for Engineering a Sustainable Future
    PublisherAIChE
    Pages605-607
    Number of pages3
    ISBN (Electronic)9781634390392
    StatePublished - 2013
    EventEngineering Sciences and Fundamentals 2013 - Core Programming Area at the 2013 AIChE Annual Meeting: Global Challenges for Engineering a Sustainable Future - San Francisco, United States
    Duration: Nov 3 2013Nov 8 2013

    Publication series

    NameEngineering Sciences and Fundamentals 2013 - Core Programming Area at the 2013 AIChE Annual Meeting: Global Challenges for Engineering a Sustainable Future
    Volume2

    Other

    OtherEngineering Sciences and Fundamentals 2013 - Core Programming Area at the 2013 AIChE Annual Meeting: Global Challenges for Engineering a Sustainable Future
    CountryUnited States
    CitySan Francisco
    Period11/3/1311/8/13

    ASJC Scopus subject areas

    • Engineering(all)
    • Chemical Engineering(all)

    Cite this

    Kim, S. Y., Davis, R. L., Michal, B. T., Gwyther, J., Manners, I., Chaikin, P. M., & Register, R. A. (2013). Patterning nano-square arrays using shear-aligned block copolymer thin films. In Engineering Sciences and Fundamentals 2013 - Core Programming Area at the 2013 AIChE Annual Meeting: Global Challenges for Engineering a Sustainable Future (pp. 605-607). (Engineering Sciences and Fundamentals 2013 - Core Programming Area at the 2013 AIChE Annual Meeting: Global Challenges for Engineering a Sustainable Future; Vol. 2). AIChE.