Physical and electrical characterization of the interface between atomic-layer-deposited Al2O3 on GaAs substrates for CMOS applications

D. I. Garcia-Gutierrez; V. Kaushik; D. Shahrjerdi; S. K. Banerjee

doi:10.1017/S1431927608083001

Physical and electrical characterization of the interface between atomic-layer-deposited Al₂O₃ on GaAs substrates for CMOS applications

D. I. Garcia-Gutierrez, V. Kaushik, D. Shahrjerdi, S. K. Banerjee

Electrical and Computer Engineering

Research output: Contribution to journal › Article › peer-review

Original language	English (US)
Pages (from-to)	446-447
Number of pages	2
Journal	Microscopy and Microanalysis
Volume	14
Issue number	SUPPL. 2
DOIs	https://doi.org/10.1017/S1431927608083001
State	Published - Aug 2008

ASJC Scopus subject areas

Instrumentation

Access to Document

10.1017/S1431927608083001

Cite this

@article{42ad022e48c244e2bd76b50cba6e85d4,

title = "Physical and electrical characterization of the interface between atomic-layer-deposited Al2O3 on GaAs substrates for CMOS applications",

author = "Garcia-Gutierrez, {D. I.} and V. Kaushik and D. Shahrjerdi and Banerjee, {S. K.}",

year = "2008",

month = aug,

doi = "10.1017/S1431927608083001",

language = "English (US)",

volume = "14",

pages = "446--447",

journal = "Microscopy and Microanalysis",

issn = "1431-9276",

publisher = "Oxford University Press",

number = "SUPPL. 2",

}

TY - JOUR

T1 - Physical and electrical characterization of the interface between atomic-layer-deposited Al2O3 on GaAs substrates for CMOS applications

AU - Garcia-Gutierrez, D. I.

AU - Kaushik, V.

AU - Shahrjerdi, D.

AU - Banerjee, S. K.

PY - 2008/8

Y1 - 2008/8

UR - http://www.scopus.com/inward/record.url?scp=49549086888&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=49549086888&partnerID=8YFLogxK

U2 - 10.1017/S1431927608083001

DO - 10.1017/S1431927608083001

M3 - Article

AN - SCOPUS:49549086888

SN - 1431-9276

VL - 14

SP - 446

EP - 447

JO - Microscopy and Microanalysis

JF - Microscopy and Microanalysis

IS - SUPPL. 2

ER -

Physical and electrical characterization of the interface between atomic-layer-deposited Al2O3 on GaAs substrates for CMOS applications

ASJC Scopus subject areas

Access to Document

Other files and links

Cite this

Physical and electrical characterization of the interface between atomic-layer-deposited Al₂O₃ on GaAs substrates for CMOS applications