Pixellated photonic crystal films by selective photopolymerization

Seung Kon Lee, Gi Ra Yi, Jun Hyuk Moon, Seung Man Yang, David J. Pine

Research output: Contribution to journalArticlepeer-review


Polymeric inverse opal films were prepared by using a negative photoresist of SU 8 and silica colloidal films as sacrificial templates. The composite films were produced by infiltrating the same photoresist resin through the macropores of the inverse opal scaffold. High resolution patterns at the micrometer scale were obtained by using conventional photolithography. It was observed that the residual polymer in the macropores increased with he UV exposure time and thus the effective refractive index also increased. Irradiation energy caused a incomplete curing of the photoresist that was back-filled into the macropores. A scanning electron microscopy image of a patterned inverse opal film showed the clear boundary between exposed and unexposed macropores region.

Original languageEnglish (US)
Pages (from-to)2111-2116
Number of pages6
JournalAdvanced Materials
Issue number16
StatePublished - Aug 18 2006

ASJC Scopus subject areas

  • General Materials Science
  • Mechanics of Materials
  • Mechanical Engineering


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