Plasmon-assisted chemical vapor deposition

David A. Boyd, Leslie Greengard, Mark Brongersma, Mohamed Y. Ei-Naggar, David G. Goodwin

Research output: Contribution to journalArticle

Abstract

We introduce a new chemical vapor deposition (CVD) process that can be used to selectively deposit materials of many different types. The technique makes use of the plasmon resonance in nanoscale metal structures to produce the local heating necessary to initiate deposition when illuminated by a focused low-power laser. We demonstrate the technique, which we refer to as plasmon-assisted CVD (PACVD), by patterning the spatial deposition of PbO and TiO2 on glass substrates coated with a dispersion of 23 nm gold particles. The morphology of both oxide deposits is consistent with local laser-induced heating of the gold particles by more than 150 °C. We show that temperature changes of this magnitude are consistent with our analysis of the heat-loss mechanisms. The technique is general and can be used to spatially control the deposition of virtually any material for which a CVD process exists.

Original languageEnglish (US)
Pages (from-to)2592-2597
Number of pages6
JournalNano Letters
Volume6
Issue number11
DOIs
StatePublished - Nov 2006

ASJC Scopus subject areas

  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanical Engineering

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  • Cite this

    Boyd, D. A., Greengard, L., Brongersma, M., Ei-Naggar, M. Y., & Goodwin, D. G. (2006). Plasmon-assisted chemical vapor deposition. Nano Letters, 6(11), 2592-2597. https://doi.org/10.1021/nl062061m