Plasmonic nanocomposites of zinc oxide and titanium nitride

Chad A. Beaudette; Jacob T. Held; Benjamin L. Greenberg; Phong H. Nguyen; Nolan M. Concannon; Russell J. Holmes; K. Andre Mkhoyan; Eray S. Aydil; Uwe R. Kortshagen

doi:10.1116/1.5142858

Plasmonic nanocomposites of zinc oxide and titanium nitride

Chad A. Beaudette, Jacob T. Held, Benjamin L. Greenberg, Phong H. Nguyen, Nolan M. Concannon, Russell J. Holmes, K. Andre Mkhoyan, Eray S. Aydil, Uwe R. Kortshagen

Chemical and Biomolecular Engineering

Research output: Contribution to journal › Article › peer-review

Abstract

The authors produce plasmonic ZnO-TiN nanocomposite films by depositing plasma-synthesized ZnO nanocrystals onto a substrate and then by infilling the nanocrystal network's pores with TiN via remote plasma-enhanced atomic layer deposition (PEALD). This ZnO-TiN nanocomposite exhibits a plasmonic resonance that is blueshifted compared to planar titanium nitride thin films. The authors study the effects of PEALD conditions and the ZnO film thickness on the plasmonic response of these nanocomposites and exploit the optimized film in a device that generates photocurrent at zero bias.

Original language	English (US)
Article number	042404
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	38
Issue number	4
DOIs	https://doi.org/10.1116/1.5142858
State	Published - Jul 1 2020

ASJC Scopus subject areas

Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films

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abstract = "The authors produce plasmonic ZnO-TiN nanocomposite films by depositing plasma-synthesized ZnO nanocrystals onto a substrate and then by infilling the nanocrystal network's pores with TiN via remote plasma-enhanced atomic layer deposition (PEALD). This ZnO-TiN nanocomposite exhibits a plasmonic resonance that is blueshifted compared to planar titanium nitride thin films. The authors study the effects of PEALD conditions and the ZnO film thickness on the plasmonic response of these nanocomposites and exploit the optimized film in a device that generates photocurrent at zero bias.",

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AU - Beaudette, Chad A.

AU - Held, Jacob T.

AU - Greenberg, Benjamin L.

AU - Nguyen, Phong H.

AU - Concannon, Nolan M.

AU - Holmes, Russell J.

AU - Mkhoyan, K. Andre

AU - Aydil, Eray S.

AU - Kortshagen, Uwe R.

PY - 2020/7/1

Y1 - 2020/7/1

N2 - The authors produce plasmonic ZnO-TiN nanocomposite films by depositing plasma-synthesized ZnO nanocrystals onto a substrate and then by infilling the nanocrystal network's pores with TiN via remote plasma-enhanced atomic layer deposition (PEALD). This ZnO-TiN nanocomposite exhibits a plasmonic resonance that is blueshifted compared to planar titanium nitride thin films. The authors study the effects of PEALD conditions and the ZnO film thickness on the plasmonic response of these nanocomposites and exploit the optimized film in a device that generates photocurrent at zero bias.

AB - The authors produce plasmonic ZnO-TiN nanocomposite films by depositing plasma-synthesized ZnO nanocrystals onto a substrate and then by infilling the nanocrystal network's pores with TiN via remote plasma-enhanced atomic layer deposition (PEALD). This ZnO-TiN nanocomposite exhibits a plasmonic resonance that is blueshifted compared to planar titanium nitride thin films. The authors study the effects of PEALD conditions and the ZnO film thickness on the plasmonic response of these nanocomposites and exploit the optimized film in a device that generates photocurrent at zero bias.

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Plasmonic nanocomposites of zinc oxide and titanium nitride

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