Properties of the rf discharge in Ar-TEOS mixtures

R. Foest, R. Basner, M. Schmidt, F. Hempel, Kurt Becker

Research output: Chapter in Book/Report/Conference proceedingChapter (peer-reviewed)

Original languageEnglish (US)
Title of host publicationGaseous dielectrics VIII
EditorsL.G. Christophorou
Place of PublicationNew York
PublisherPlenum Press
Pages161-166
StatePublished - 1998

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