Abstract
This work presents vertical flash memory devices with protein-assembled PbSe nanocrystals as a floating gate and Al 2O 3 as a control oxide. The advantage of a vertical structure is that it improves cell density. Protein assembly improves uniformity of nanocrystals, which reduces threshold voltage variation among devices. The introduction of Al 2O 3 as a control oxide provided lower voltage/faster operation and hence less power consumption compared with the devices fabricated with SiO 2. The integration of Al 2O 3 appeared to be compatible with the protein assembly approach. In conclusion, Al 2O 3 has the potential to become the high-k control oxide due to its relatively high electron/hole barrier heights, and high permittivity.
Original language | English (US) |
---|---|
Pages (from-to) | 438-442 |
Number of pages | 5 |
Journal | Journal of Electronic Materials |
Volume | 38 |
Issue number | 3 |
DOIs | |
State | Published - Mar 2009 |
Keywords
- High-k dielectric
- Nanocrystal memory devices
- Protein assembly
- Vertical structure
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Electrical and Electronic Engineering
- Materials Chemistry