Reaction Control in Amorphous Silicon Film Deposition by Hydrogen Chloride

Akihiro Takano, Takehito Wada, Shinji Fujikake, Takashi Yoshida, Tokio Ohto, Eray S. Aydil

Research output: Contribution to journalConference articlepeer-review

Fingerprint Dive into the research topics of 'Reaction Control in Amorphous Silicon Film Deposition by Hydrogen Chloride'. Together they form a unique fingerprint.

Chemical Compounds

Engineering & Materials Science

Physics & Astronomy