Real-time monitoring of surface chemistry during plasma processing

E. S. Aydil; R. A. Gottscho; Y. J. Chabal

doi:10.1351/pac199466061381

Real-time monitoring of surface chemistry during plasma processing

E. S. Aydil, R. A. Gottscho, Y. J. Chabal

Chemical and Biomolecular Engineering

Research output: Contribution to journal › Article › peer-review

Abstract

Techniques available for real time, in situ monitoring of surface chemistry during plasma processing are reviewed. Emphasis is given to recent uses of attenuated-total-reflection Fourier transform infrared (ATR-FTIR) spectroscopy to study surface bond vibrations during plasma cleaning and passivation of Si and GaAs surfaces. Examples are chosen to demonstrate the utility of real-time monitoring of surfaces for developing and optimizing plasma processes used in manufacturing of electronic and optoelectronic devices.

Original language	English (US)
Pages (from-to)	1381-1388
Number of pages	8
Journal	Pure and Applied Chemistry
Volume	66
Issue number	6
DOIs	https://doi.org/10.1351/pac199466061381
State	Published - 1994

ASJC Scopus subject areas

General Chemistry
General Chemical Engineering

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10.1351/pac199466061381

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abstract = "Techniques available for real time, in situ monitoring of surface chemistry during plasma processing are reviewed. Emphasis is given to recent uses of attenuated-total-reflection Fourier transform infrared (ATR-FTIR) spectroscopy to study surface bond vibrations during plasma cleaning and passivation of Si and GaAs surfaces. Examples are chosen to demonstrate the utility of real-time monitoring of surfaces for developing and optimizing plasma processes used in manufacturing of electronic and optoelectronic devices.",

author = "Aydil, {E. S.} and Gottscho, {R. A.} and Chabal, {Y. J.}",

year = "1994",

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AU - Gottscho, R. A.

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AB - Techniques available for real time, in situ monitoring of surface chemistry during plasma processing are reviewed. Emphasis is given to recent uses of attenuated-total-reflection Fourier transform infrared (ATR-FTIR) spectroscopy to study surface bond vibrations during plasma cleaning and passivation of Si and GaAs surfaces. Examples are chosen to demonstrate the utility of real-time monitoring of surfaces for developing and optimizing plasma processes used in manufacturing of electronic and optoelectronic devices.

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Real-time monitoring of surface chemistry during plasma processing

Abstract

ASJC Scopus subject areas

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