We fabricate and characterize dual-gated graphene field-effect transistors using Al2O3 as top-gate dielectric. We use a thin Al film as a nucleation layer to enable the atomic layer deposition of Al 2O3. Our devices show mobility values of over 8000 cm 2 /V s at room temperature, a finding which indicates that the top-gate stack does not significantly increase the carrier scattering and consequently degrade the device characteristics. We propose a device model to fit the experimental data using a single mobility value.
|Original language||English (US)|
|Journal||Applied Physics Letters|
|State||Published - 2009|
ASJC Scopus subject areas
- Physics and Astronomy (miscellaneous)