Relation between the ion flux, gas phase composition, and wall conditions in chlorine plasma etching of silicon

Saurabh J. Ullal, Tae Won Kim, Vahid Vahedi, Eray S. Aydil

Research output: Contribution to journalArticlepeer-review

Fingerprint

Dive into the research topics of 'Relation between the ion flux, gas phase composition, and wall conditions in chlorine plasma etching of silicon'. Together they form a unique fingerprint.

Engineering & Materials Science

Physics & Astronomy

Chemical Compounds