Reliability study of titanium silicide lines using micro-Raman spectroscopy and emission microscopy

I. De Wolf; D. J. Howard; M. Rasras; A. Lauwers; K. Maex; G. Groeseneken; H. E. Maes

Reliability study of titanium silicide lines using micro-Raman spectroscopy and emission microscopy

I. De Wolf, D. J. Howard, M. Rasras, A. Lauwers, K. Maex, G. Groeseneken, H. E. Maes

Research output: Contribution to journal › Conference article › peer-review

Abstract

Micro-Raman spectroscopy and emission microscopy are used to study the crystallographic phase of 0.25 μm wide TiSi₂ lines. It is demonstrated that these techniques allow non-destructive mapping of the local phase of TiSi₂. The results show that there is a direct correlation between the resistance variation of these lines and the local occurrence of the high resistivity C49 phase of TiSi₂ in the lines.

Original language	English (US)
Pages (from-to)	124-128
Number of pages	5
Journal	Annual Proceedings - Reliability Physics (Symposium)
State	Published - 1998
Event	Proceedings of the 1998 36th IEEE International Reliability Physics Symposium - Reno, NV, USA Duration: Mar 31 1998 → Apr 2 1998

ASJC Scopus subject areas

Electrical and Electronic Engineering
Safety, Risk, Reliability and Quality

Cite this

@article{3ec5842ffd0b43aa8a730239fa3e2aec,

title = "Reliability study of titanium silicide lines using micro-Raman spectroscopy and emission microscopy",

abstract = "Micro-Raman spectroscopy and emission microscopy are used to study the crystallographic phase of 0.25 μm wide TiSi2 lines. It is demonstrated that these techniques allow non-destructive mapping of the local phase of TiSi2. The results show that there is a direct correlation between the resistance variation of these lines and the local occurrence of the high resistivity C49 phase of TiSi2 in the lines.",

author = "{De Wolf}, I. and Howard, {D. J.} and M. Rasras and A. Lauwers and K. Maex and G. Groeseneken and Maes, {H. E.}",

year = "1998",

language = "English (US)",

pages = "124--128",

journal = "Annual Proceedings - Reliability Physics (Symposium)",

issn = "0099-9512",

note = "Proceedings of the 1998 36th IEEE International Reliability Physics Symposium ; Conference date: 31-03-1998 Through 02-04-1998",

}

TY - JOUR

T1 - Reliability study of titanium silicide lines using micro-Raman spectroscopy and emission microscopy

AU - De Wolf, I.

AU - Howard, D. J.

AU - Rasras, M.

AU - Lauwers, A.

AU - Maex, K.

AU - Groeseneken, G.

AU - Maes, H. E.

PY - 1998

Y1 - 1998

N2 - Micro-Raman spectroscopy and emission microscopy are used to study the crystallographic phase of 0.25 μm wide TiSi2 lines. It is demonstrated that these techniques allow non-destructive mapping of the local phase of TiSi2. The results show that there is a direct correlation between the resistance variation of these lines and the local occurrence of the high resistivity C49 phase of TiSi2 in the lines.

AB - Micro-Raman spectroscopy and emission microscopy are used to study the crystallographic phase of 0.25 μm wide TiSi2 lines. It is demonstrated that these techniques allow non-destructive mapping of the local phase of TiSi2. The results show that there is a direct correlation between the resistance variation of these lines and the local occurrence of the high resistivity C49 phase of TiSi2 in the lines.

UR - http://www.scopus.com/inward/record.url?scp=0031680838&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0031680838&partnerID=8YFLogxK

M3 - Conference article

AN - SCOPUS:0031680838

SN - 0099-9512

SP - 124

EP - 128

JO - Annual Proceedings - Reliability Physics (Symposium)

JF - Annual Proceedings - Reliability Physics (Symposium)

T2 - Proceedings of the 1998 36th IEEE International Reliability Physics Symposium

Y2 - 31 March 1998 through 2 April 1998

ER -

Reliability study of titanium silicide lines using micro-Raman spectroscopy and emission microscopy

Abstract

ASJC Scopus subject areas

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